About ESCs
Whenever it is about developing an E-Chuck for a new application,
improving an existing application according to a Continuous improvement Plan (CIP), or simply securing your Electrostatic Chuck source, C-Click approach is always global. All parameters, technical, economical and industrial are taken into account.
At the end of the day, your process efficiency, quality and repeatability strongly rely on parameters related to the ESC itself and to the surrounding devices and fixtures.
Our approach
Based on a strong culture of optimization, we focus on your need first (the functionality), but always take into account all the aspects of the topic.
This includes, and is not limited to :
ESC Functionalities
process chamber
Wafer
Clamping
Wafer
Thermalization
Wafer
electrical state
HV Power Supply
(for monopolar, bipolar, multipolar)
Hot Source (Heater)
One or more zone
Embedded or stand alone
Coupling Gas / Cooling Gas / Back Side Gas
Supply & monitoring
RF / Pulsed DC
introduction & insulation
HV Connectors / Feedthroughs
Pedestal
Connectors / Feedthroughs
Connectors / Feedthroughs
Interfacing with the rest of the world
Global Approach
Capex
Process Monitoring
COO
Wafer Integrity
Cleaning / Particles /
Metal conta / contact ratio
Tool Uptime & throughput
Clamp / declamp ;
MTBF ; MTTR ;
Plug & Play
Field Service
Supply Chain
JIT ; Reworkability ;
Differentiation postponement ;
standardization
Technical support
