TECHNOLOGIES
SUBSTRATES
PROCESSES
USERS

About ESCs

Whenever it is about developing an E-Chuck for a new application,

improving an existing application according to a Continuous improvement Plan (CIP), or simply securing your Electrostatic Chuck source, C-Click approach is always global. All parameters, technical, economical and industrial are taken into account.

At the end of the day, your process efficiency, quality and repeatability strongly rely on parameters related to the ESC itself and to the surrounding devices and fixtures.

Our approach

TECHNOLOGIES

SUBSTRATE

PROCESSES

FOR WHO

Based on a strong culture of optimization, we focus on your need first (the functionality), but always take into account all the aspects of the topic.

This includes, and is not limited to :

  • Technical performances

  • Quality management

  • Logistics

  • Maintainability, reworkability

  • Flexibility & improvements

Functionality
Global approach

ESC Functionalities

process chamber

Wafer
Clamping

Wafer
Thermalization

Wafer
electrical state

HV Power Supply

(for monopolar, bipolar, multipolar)

Hot Source (Heater)

One or more zone
Embedded or stand alone

Coupling Gas / Cooling Gas / Back Side Gas

Supply & monitoring

RF / Pulsed DC

introduction & insulation

Clamping Signal

Cold Source (Cooling)

One or more zone
Embedded or stand alone

Temperature monitoring & regulation

RTD / TC / IR

Wafer grounding & ESD

introduction & insulation

Wafer biasing

HV Connectors / Feedthroughs

Pedestal

Connectors / Feedthroughs

Connectors / Feedthroughs

Interfacing with the rest of the world

Global Approach

Capex

Process Monitoring

COO

Wafer Integrity

Cleaning / Particles /
Metal conta / contact ratio

Tool Uptime & throughput

Clamp / declamp ;
MTBF ; MTTR ;
Plug & Play

Field Service

Supply Chain

JIT ; Reworkability ;
Differentiation postponement ;
standardization

Technical support